Sputtering Targets

China Iron & Steel Research Institute Group has 60 years' experience in metal materials, and we produced the first Cr target in China decades of years before, and lead the target industry in China.
We have three technologies to produce the targets. The first one is by vacuum furnace to melt the metals, such as NiCr, NiAl, NiCu and NiV targets. The second one is powder metallurgy method by HIP/CIP, such as Cr targets. The third one is plasma spraying, such as SiAl targets.
We not only produce planar targets but also rotary targets.
We mainly supply targets for the industry of LOW-E glass, FPD, Tooling and Solar, etc.
For Low-E glass industry, we supply rotary SiAl, TiOx, SnZn, ZnAl, Sn, Cr, Si and stainless steel 316L and planar NiCr, Cr targets.
For FPD industry, we mainly supply planar Mo, Nb, Ti and Al targets and rotary Nb targets.
For solar industry, we mainly supply planar AZO, Mo, NiCu, NiAl, NiCr, NiV and Al targets and rotary AZO and Mo targets.
For tooling industry, we mainly supply TiAl by HIP and TiAl by melting method and Cr targets.
The delivery time of sputtering targets is usually four weeks for sample order, and the delivery time is two to three weeks for regular shipment.