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SKU:PT004

Cr Target

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CISRI International offers various of sputtering targets for FPD applications such as TN、STN、TFT-LCD、FED、PDP、OLED and CF(Color Filter).

These targets include: Cr, Mo, AZO, Al, Ag, Ta, W, etc.

The largest HIP equipment in China is located in CISRI, which can be used to produce the high purity Cr target with length over 1800mm. Furthermore, CISRI owns the largest vacuum sintering furnace with high temperature, which can be used to produce the high purity Mo target with large dimension.

Cr target:

Properies of Cr Target

Purity

99.95% ~ 99.98% (3N5 ~ 3N8)

Relative Density

>99.6%

Grain Size

<150µm

Dimension

Max Length: 1800mm; Max Width: 350mm; Max Dia: 500mm;Max Length for tube: 4000mm

Other special specifications are available on customers’ request.

Cr Rotary target

Properies of Cr Rotary Target

Purity

>99.5% (2N5 )

Relative Density

>90%

Production Process

Plasma Spray Process or HIP

Dimension

Max Length: 4000mm

Other special specifications are available on customers’ request.


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