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SKU:PT003

Si Target

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China Iron & Steel Research Institute Group has 60 years experience in metal materials, and we produced the first Cr target in China decades years before, and lead the target industry in China.

We have three technologies to produce the targets. The first one is by vacuum furnace to melt the metals, such as NiCr, NiAl, NiCu and NiV targets. The second one is powder metallurgy method by HIP/CIP, such as Cr targets. The third one is plasma spraying, such as SiAl targets.

We not only produce planar targets but rotary targets.

We mainly supply targets for the industry of LOW-E glass, FPD, Tooling and Solar etc.

For Low-E glass industry, we supply rotary SiAl, TiOx, SnZn, ZnAl, Sn, Cr, Si and stainless steel 316L and planar NiCr, Cr targets.

Si target

Properies of Si Target

Purity

5N

Relative Density

>99%

Size

MAX:300x150x(6~10)mm

Dimension

Max Length: 4000mm, Thickness: 3~13mm

Electrical Resistivity at 20℃

<0.2Ω·cm

Other special specifications are available on customers’ request.


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