|Next
SKU:CR-12

W Target

χ

1 item add to inquiry basket.

Enter Inqulry Basket now.

χ

This item was already in your inquiry basket.

check your Inquiry Basket now.

  • Product Details
  • Make an Inquiry

CISRI International offers various of sputtering targets for FPD applications such as TN, STN, TFT-LCD, FED, PDP, OLED and CF (Color Filter).
These targets include: Cr, Mo, AZO, Al, Ag, Ta, W, etc.

The largest HIP equipment in China is located in CISRI, which can be used to produce the high purity Cr target with length over 1800mm. Furthermore, CISRI owns the largest vacuum sintering furnace with high temperature, which can be used to produce the high purity Mo target with large dimension.


Mo and W

Properties of Mo and W Target

Purity

>99.95% ~ 99.98% (3N5 ~ 3N8)

Relative Density

>99%

Grain Size

<100┬Ám

Dimension

Max Length: 2000mm; Max Dia: 500mm

Other special specifications are available on customers' request.




Agree with this Privacy Policy
Please check box if you agree with our Privacy Policy.